A review of available sources identified exposure limits for vanadium (V as V₂O₅; CASRN: 1314-62-1; IDLH, PEL-C, REL-C, TWAs). Data sources were selected according to the hierarchy listed in Table 3.1. The 1990 and 1994 IDLH were evaluated as a TEEL-3; the 1990 IDLH reports a vanadium pentoxide basis (V2O5, CASRN: 1314-62-1), while the 1994 IDLH reports a vanadium basis for the same source data. As such, analysts selected the 1994 IDLH as the TEEL-3. The LOC was considered as a TEEL-2; however, this value was not selected because 1) it is derived from the 1990 IDLH, which was not selected as a TEEL-3, and 2) it is an order of magnitude greater than other TEEL-2 available bases (ceiling limits, TWAs; Section 3.3.1). Instead, the most preferred vanadium ceiling limit, the PEL-C for vanadium, as vanadium pentoxide (Section 3.4.6), was selected as the TEEL-2. The TEEL-1 value was derived according to Table 3.5.
• TEEL-1 = TEEL-2/11
• TEEL-2 = PEL-C (vanadium dust, CASRN: 1314-62-1, 0.5 mg/m³)
• TEEL-3 = IDLH (1994, vanadium, 35 mg/m3)
This review generated TEEL-2 and TEEL-1 values inconsistent with Rev. 29A. The Rev. 29A and current TEEL-3 values, source, and methodology are consistent. The 1994 IDLH was used according to Handbook guidelines (Section 4.2-4.3). The Rev. 29A TEEL-2 was derived from the TEEL-3, while the current TEEL-2 is a the PEL-C for vanadium, as vanadium pentoxide, a more preferred source for a structurally similar chemical (Table 3.1, Section 3.4.6). The Rev. 29A was a REL-STEL for ferrovanadium (CASRN: 12604-58-9) while the current TEEL-1 was derived from the TEEL-2 (Section 3.4.2).